Vacuum Medium Frequency Induction Sintering Furnace For Sputtering Target Mo Plate

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    Reading Alloys also supplies high-purity metal powders for the military, medical, electronic, semiconductor, sputtering target and powder metallurgy markets. A Tradition of Excellence Reading Alloys was founded in 1953 on the principles of excellence in applied metallurgical research and development.

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  • etallurgy and ferrous or non-ferrous alloys and treatment

    FIELD: metallurgy.SUBSTANCE: method includes the stages of (i) irradiation in predominantly oxygen-free medium of cured coated metal Mo-100-target plate with protons emitted by the cyclotron, (ii) dissolving molybdenum ions and technetium ions from irradiated target plate in H2O2 (iv) adjusting the pH of the oxide solution to about 14, (v

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  • Target Composition Patents and Patent Applications (Class

    Abstract: Provided is a sintered body comprising LiCoO2 used for a sputtering target. The area A of a surface of the sintered body that corresponds to a sputtering surface is 200-1500 cm2 and the relative density of the entire sintered body is 75% or higher.

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    The Cu alloy ingot was prepared by high frequency induction furnace melting, and it was extruded to round bar at 873 K. The mechanical properties of the materials are as following; tensile strength, yield strength, tensile elongation, and Vickers hardness are 672, 315 MPa, 17 % and 180 Hv for Cu alloy, and 985 MPa, 817 MPa, 15 % and 318 Hv for

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    The detailed methods are as below: hot pressing (HP), cold isostatic pressing(CIP), cold pressing and sinter, vacuum induction melting (VIM), vacuum induced levitation melting furnace vacuum sintering, vacuum melting casting, vacuum arc melting, vacuum sinter, FZ, CZ, CVD, Vacuum forging and so on.

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    The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm without breaking a vacuum. The wafers are mounted one-by-one onto a rotating pallet in the pre-cleaning chamber and sputtering chamber.

  • With one or more layers not made from powder, e.g. made

    Sintering is performed in two stages: first, pressed article is sintered in chamber furnace at 1150-1200 °C for 100-200 min in protective atmosphere, then high-temperature sintering is performed for surface layer by frequency current at 1300-1400 °C for 10-40 s to depth of 3-4 mm.

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    Sintering of the compacted powder is usually carried out in vacuum. The PA method refers to sintering PA powders, which are typically made using the gas atomisation (GA) or the plasma rotating electrode process (PREP).

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